问题描述：
英语翻译
21.M.Rossi,C.G.Blough,D.H.Raguin,E.K.Popov,and D.
Maystre,“Diffraction efficiency of high-NA continuous-relief
diffractivelenses,”in DiffractiveOpticsandMicro-Optics,Vol.
5 of 1996 OSA Technical Digest SeriesOptical Society of
America,Washington,D.C.,1996,pp.233–236.
22.J.D.Gaskill,Linear Systems,Fourier Transforms and OpticsWiley,New York,1978,Chap.10.2.
23.The CSEM laser-beam-writing system was developed at the
PaulScherrerInstituteZurich,whichwasmergedwithCSEM
in July 1997.
24.M.T.Gale,“Replication,”inMicro-Optics—Elements,Systems,
andApplications,H.P.Herzig,ed.Taylor&Francis,London,
1997.
25.M.Kuittinen,H.P.Herzig,and P.Ehbets,“Improvements in
diffraction efficiency of gratings and microlenses with contin-
uous relief structures,” Opt.Commun.120,230–2341995.
26.T.Fujita,H.Nishihara,and J.Koyama,“Blazed gratings and
Fresnel lenses fabricated by electron-beam lithography,” Opt.
Lett.7,578–5801982.
27.E.Carcole′,J.Campos,I.Juvells,and S.Bosch,“Diffraction
efficiencyoflow-resolutionFresnelencodedlenses,”Appl.Opt.
33,6741–67461994.
28.Matlab Optimization Toolbox 1.5,The MathWorks Inc.,
Natick,Mass.1996.
29.D.A.BuralliandG.M.Morris,“Effectsofdiffractionefficiency
on the modulation transfer function of diffractive lenses,”
Appl.Opt.31,4389–43961992.
30.P.Ehbets,M.Rossi,and H.P.Herzig,“Continuous-relief fan
outelementswithoptimizedfabricationtolerances,”Opt.Eng.
34,3456–34641995.
31.F.Nikolajeff,S.Hard,and B.Curtis,“Diffractive microlenses
replicated in fused silica for excimer laser-beam homogeniz-
ing,” Appl.Opt.36,8481–84891997.
32.J.Bengtsson,“Direct inclusion of the proximity effect in the
calculation of kinoforms,” Appl.Opt.33,4993–49961994.
33.M.Larsson,M.Ekberg,F.Nikolajeff,andS.Hard,“Successive
development optimization of resist kinoforms manufactured
withdirect-writing,electron-beamlithography,”Appl.Opt.33,
1176–11791994.
21.M.Rossi,C.G.Blough,D.H.Raguin,E.K.Popov,and D.
Maystre,“Diffraction efficiency of high-NA continuous-relief
diffractivelenses,”in DiffractiveOpticsandMicro-Optics,Vol.
5 of 1996 OSA Technical Digest SeriesOptical Society of
America,Washington,D.C.,1996,pp.233–236.
22.J.D.Gaskill,Linear Systems,Fourier Transforms and OpticsWiley,New York,1978,Chap.10.2.
23.The CSEM laser-beam-writing system was developed at the
PaulScherrerInstituteZurich,whichwasmergedwithCSEM
in July 1997.
24.M.T.Gale,“Replication,”inMicro-Optics—Elements,Systems,
andApplications,H.P.Herzig,ed.Taylor&Francis,London,
1997.
25.M.Kuittinen,H.P.Herzig,and P.Ehbets,“Improvements in
diffraction efficiency of gratings and microlenses with contin-
uous relief structures,” Opt.Commun.120,230–2341995.
26.T.Fujita,H.Nishihara,and J.Koyama,“Blazed gratings and
Fresnel lenses fabricated by electron-beam lithography,” Opt.
Lett.7,578–5801982.
27.E.Carcole′,J.Campos,I.Juvells,and S.Bosch,“Diffraction
efficiencyoflow-resolutionFresnelencodedlenses,”Appl.Opt.
33,6741–67461994.
28.Matlab Optimization Toolbox 1.5,The MathWorks Inc.,
Natick,Mass.1996.
29.D.A.BuralliandG.M.Morris,“Effectsofdiffractionefficiency
on the modulation transfer function of diffractive lenses,”
Appl.Opt.31,4389–43961992.
30.P.Ehbets,M.Rossi,and H.P.Herzig,“Continuous-relief fan
outelementswithoptimizedfabricationtolerances,”Opt.Eng.
34,3456–34641995.
31.F.Nikolajeff,S.Hard,and B.Curtis,“Diffractive microlenses
replicated in fused silica for excimer laser-beam homogeniz-
ing,” Appl.Opt.36,8481–84891997.
32.J.Bengtsson,“Direct inclusion of the proximity effect in the
calculation of kinoforms,” Appl.Opt.33,4993–49961994.
33.M.Larsson,M.Ekberg,F.Nikolajeff,andS.Hard,“Successive
development optimization of resist kinoforms manufactured
withdirect-writing,electron-beamlithography,”Appl.Opt.33,
1176–11791994.
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