问题描述：
英语翻译
金属薄膜的制备和其特性的研究已是当今微电子和材料科学的重要课题.本论文主要论述了溅射镀膜原理,薄膜生长原理,及其在物理实验中动态监测薄膜生长技术.还探索了相关实验教学装置的设计,有关电路的搭建,实验条件的获得等.把溅射镀膜及薄膜生长动态监测运用到普通物理实验,是一大创新,特别是在教学中能发挥重要作用,能更好的使我们掌握这一知识,并能加深应用.随着镀膜技术的不断发展,该课题还存在大量的后续研究工作.
问题解答：
我来补答
The preparation of metal film and its characteristics already is the microelectronics and materials science as an important issue.This thesis mainly discusses the sputtering film coating principle,principle of the growth of thin films,and its physical experiment in dynamic monitoring in the growth of thin films is technology.Also explores the related experimental teaching equipment design,the construction of the circuit,the experiment condition get,etc.The sputtering film coating and the growth of thin films is applied to the dynamic monitoring general physics experiment,is a major innovation,especially in the teaching can play an important role,can better that we master the knowledge,and can deepen the application.Along with the development of coating technology,this topic is there are a lot of subsequent research work.
