Alkaline developer for radiation sensitive compositions
The invention relates to an alkaline developer for irradiated radiation sensitive compositions,which developer is based on water and at least one inorganic salt having an alkaline reaction,wherein the developer has a pH of at least 11 and comprises at least three structurally different surfactants of formulae (A),(B) and (C),characterised in that the surfactant of formula (A) has one anionic group,the surfactant of formula (B) has two anionic groups,the surfactant of formula (C) is non-ionic and has at least one non-ionic hydrophilic group,and the concentration of each of the surfactants of formulae (A),(B) and (C) in the developer is at least 0.05 weight-% based on the total weight of the developer.The developer leads to less depositions and has a superior stability when used.
